-
Stiffness SSRM Bio frequency_modulation AlkaneFilm Wafer cooling fluoroalkane atomic_layer Phthalocyanine C60H122 Array IISCBangalore LifeScience Global_Comm semifluorinated alkane PatternedSapphireSubstrat LateralForceMicroscopy Floppy MonoLayer DIWafer DOE DentalProsthesis Polarization Permalloy self_healing HiVacuum Water PiezoelectricForceMicroscopy Steps Boundary YttriaStabilizedZirconia Fe_film heterojunctions Transparent
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
ITO Film Sputter Deposited onto Silicon
ITO-film, which was sputter deposited onto silicon. The grain size of those samples was influenced by changing the process settings in the Cluterline RAD sputter deposition system, one of the deposition tool platforms manufactured by Evatec.
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256