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CompactDisk MolecularSelfAssembly layers Current silicon_oxide LiquidImaging amplitude_modulation Formamidinium_lead_iodide Biofilm Sidewall DataStorage Lift frequency_modulation silicon_carbide Inorganic_Compound Holes Composition SelfAssembly LogAmplifier Graphene pinpoint mode Sapphire Magnetostrictive flakes mechanical_property SrTiO3 TPU FM_SKPM BiasMode FloppyDisk StyreneBeads Potential Nanopattern nanomechanical epitaxy
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Hard defect repair of photomask
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 1.25μm×1.25μm
- Pixel Size : 256×256
- Cantilever : OMCL-AC160TS for imaging, AD-40 AS for repairing (k=42N/m, f=330kHz)