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Park NX-HDM

Simply the Best AFM for Automatic Defect Review and Surface Roughness Measurement

The task of identifying nanoscale defects is a very time consuming process for engineers working with media and flat substrates. Park NX-HDM is an atomic force microscopy system that speeds up the defect review process by an order of magnitude through automated defect identification, scanning and analysis. Park NX-HDM links directly with a wide range of optical inspection tools, thus significantly increasing the automatic defect review throughput. In addition, Park NX-HDM provides accurate surface roughness measurements, scan after scan. Park NX-HDM, together with its industry's lowest noise floor, and its unique True Non-Contact™ technology, it is the most accurate AFM for surface roughness measurement in the market.

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Optimal Design for Defect Review & Surface Roughness Measurement

Park Systems Automated AFMs are engineered to excel wafer processing metrology, offering a precise toolset for critical measurements and analysis tasks. These advanced systems facilitate the detailed metrology required in semiconductor wafer processing, providing consistent, accurate, and extensive data that supports improved manufacturing processes and product quality. Designed to integrate seamlessly with existing processing lines, they deliver a robust solution for semiconductor production engineering and quality assurance.

Precision with Automated Defect Review

The task of identifying nanoscale defects is a very time-consuming process for engineers working with media and flat substrates. Park NX-HDM is an atomic force microscopy system that speeds up the defect review process by an order of magnitude through automated defect identification, scanning, and analysis. Park NX-HDM links directly with a wide range of optical inspection tools, thus significantly increasing the automatic defect review throughput.

Automatic Measurement Control

The NX-HDM is equipped with automated software that makes operation nearly effortless. Just select the desired measurement program to get precise multi-site analysis with optimized setting for cantilever tuning, scan rate, gain, and set point parameters. Park's user-friendly software interface gives you the flexibility to create customized operation routines so you can access the full power of the NX-HDM and get the measurements you need. Creating new routines is easy. It takes about 10 minutes to create a new routine from scratch, or less than 5 minutes to modify an existing one.

Automatic Defect Review and Sub-Angstrom Surface Roughness Measurement for Media and Substrates

  • Higher Throughput, Automatic Defect Review

    The Automatic Defect Review (Park ADR) in the NX-HDM speeds up and improves the way defects in substrates and media are identified, scanned, and analyzed. Using the defect location map provided by an optical inspection tool, Park ADR automatically goes to each of those locations and images the defects in two steps: first, image a larger, survey scan to refine the defect location, then image a smaller zoom-in scan to obtain the details of the defect. Test runs with real defects demonstrate a 10x increase in throughput for defect review in an automated process compared to conventional methods.

    Higher Throughput, Automatic Defect Review

  • Automated Search Scan & Zoom-in Scan

    Optimized scan parameters enable a fast two-step scan: first, a quick, low-resolution search scan to locate the defect and a high-resolution zoom-in scan to obtain defect details. The scan size and scan speed parameters are adjustable to match the user’s needs.

    Automated Search Scan & Zoom-in Scan

  • Automatic Transfer and Alignment of Defect Maps

    Utilizing an advanced proprietary mapping algorithm, the defect map obtained from automated optical inspection (AOI) tool is accurately transferred and mapped onto Park NX-HDM. This technology allows full automation for high throughput defect imaging.

    Automatic Transfer and Alignment of Defect Maps

  • Sub-Angstrom, Surface Roughness Measurement

    Increasingly, industries require ultra-flat media and substrate to address the ever-shrinking device dimensions. Park NX-HDM provides accurate sub-angstrom surface roughness measurements, scan after scan. Park NX-HDM, together with its industry’s lowest noise floor, and its unique True Non-Contact™ technology, it is the most accurate AFM for surface roughness measurement in the market.

    Sub-Angstrom, Surface Roughness Measurement

Applications

Perfect for Diverse Applications