-
KAIST fluoroalkane Annealing rubber WPlug STM Metal-organicComplex CrystalGrowing SmalScan Lattice Pores PinPointMode BariumTitanate Sperm thermal_property Sidewall solar_cell SicMosfet Crystal Force-distance Composition MoirePattern Biofilm PolyimideFilm SmallScan PFM LateralPFM Tungsten_disulfide lithography OrganicCompound CntFilm IndiumTinOxide Grain kelvin probe force microscopy Hysteresys
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Trench Etch Profile on Si Wafer
Top dielectric trench etch profile on Si wafer having tapered slope at the trench sidewall.
Scanning Conditions
- System: NX20
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256