-
Growth YttriaStabilizedZirconia ElectrostaticForceMicroscopy Display Magnetic ThermalConductivity OpticalWaveguides ElectroChemical Polypropylene Subhajjit Modulus self-assembled_monolayer Scanning_Thermal_Microscopy conductive GranadaUniv NUS_Physics Floppy Polymer Tungsten CalciumHydroxyapatite Techcomp HighAcpectRatio semifluorinated_alkanes ItoGlass Mapping China Patterns Photovoltaics NCM\ AdhesionEnergy Trench cannabis Implant Nickel Laser
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Hard defect repair of photomask
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 1.25μm×1.25μm
- Pixel Size : 256×256
- Cantilever : OMCL-AC160TS for imaging, AD-40 AS for repairing (k=42N/m, f=330kHz)