Media
The European edition of the NANOscientific Symposium Series, the NSFE, is an open AFM User Forum focusing on sharing and exchanging cutting-edge research for both materia...
在先进半导体制程领域中,光刻技术扮演着极其重要且关键的角色。其中,光掩模作为微缩图形的来源,如何确保其图形正确而不被缺陷所影响,缺陷检测与修复成了光掩模不可或缺的工序。文中介绍原子力显微镜作为高精度纳米级定位与量测系统,可用来针对光掩模上的缺陷形貌、尺寸大小、定位缺陷位置与种类做进一步检验 (Defect Review),并生成三维形貌和...
14
Nov 2014'
User Meeting
2014년 제4차 Basic User Training을 11월 14일(금) 파크시스템스 본사에서 실시합니다. Basic User Training에서는 AFM의 기본원리 및 실습이 이루어집니다. 여러분의 많은 참여 바랍니다.
1. 교육내용 AFM의 기본원리&n...
30
Nov -0001'
SICM
Brian Choi, Bio-application scientistFor more information, please contact app@parksystems.comData Reference: Gordon Jung, Application Scientist
Targeted patch clampin...
Dr. Tobias Cramer, Asst. Professor and Researcher at Universityof Bologna, Italy.
Professor Cramer works in the semiconductor physics group at University of Bologna, Ita...
Message from Editor
A Tribute to Dr. Calvin Quate (1923-2019)
Dr. Ken Nakajima Tokyo Institute of Technology
Responsive Hydrogel Coatings From Pectin Polysaccharides E...
Dr. Jingyu Wang
Jingyu Wang is currently a postdoctoral fellow in South China University of Technology. He received his PhD degree from this South China ...
Andrea Cerreta1, Zeinab Eftekhari2, Rebecca Saive2, Alexander Klasen1 1Park Systems Europe, Germany 2Inorganic Materials Science, MESA+, University of Twente, Enschede, 7...
30
Nov -0001'
SICM
Brian Choi, Bio-application scientistFor more information, please contact app@parksystems.comData Reference: Gordon Jung, Application Scientist
Many toxins can cause ...
30
Nov -0001'
Programs
Poster PrizeENTRY FORM
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