MoS₂ layers on SiO₂

MoS2 Layers on SiO2

Scanning Conditions

- System: NX10
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 1Hz
- Pixel Size: 256 × 256

Application

Semiconductor

Related Modes

True Non-Contact™ Mode

Related Contents

Sample Images

Defect on PR Patterns
Sample Images

300 mm Wafer Edge
Sample Images

Trench Etch Profile on MESA
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