Self-organization of complete organic monolayers via sequential post-deposition annealing
Speaker : Cristiano Albonetti Affiliation : CNR-ISMN, Italy Region : Europe Year : 2019 Language : English Explore the self-organization of organic monolayers on low-interacting surfaces like silicon oxide through sequential post-deposition annealing. Witness the method's efficacy in achieving smooth, continuous monolayers for surface modification, enhancing molecular coverage and uniformity.
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